The new type of vanadium alloy which is resistant to helium-ion sputtering solves the problem of weak anti-helium-ion sputtering ability in the prior art. In the alloy of the invention, the weight percentage of each component is: Cr: 3.0 ~ 6.5%, Ti: 3.0 ~ 6.5%, Y: 0.1 ~ 2.0%, V: margin. At the same time, the invention also provides a method for preparing the alloy. The vanadium alloy of the invention is based on the V-CR-Ti ternary alloy system, and Cr and Ti are taken as the main alloying elements. Through simple alloying means, the addition of rare earth element yttrium is used to reduce the content of solid dissolved oxygen in the vanadium alloy, reduce the grain size of the ingot, and combined with the processing means of plastic deformation, the yttrium oxide with stable high temperature performance is dispersed on the matrix. At the same time, the grain size of the alloy after high temperature annealing is significantly refined and homogenized, which improves the toughness of the alloy and greatly enhances the ability of the alloy to resist helium ion sputtering.
Compared with other structural materials, vanadium alloy has excellent low activation characteristics, high temperature strength and low toughness and brittle-brittle-transition temperature. Vanadium alloy has attracted much attention in the design of the first wall, cladding and diverter of fusion reactors, and is the most promising application in Li/V cladding. After systematic and in-depth research, and according to a number of performance assessment results, the United States, Japan and other countries have first promoted V-4Cr-4Ti as a candidate material for fusion reactor structure. In fusion reactor, deuterium tritium plasma and α particles escaping from the plasma zone will produce helium ion irradiation and sputtering on V-4Cr-4Ti alloy, resulting in surface bubbles and peeling. Therefore, the resistance of V-4Cr-4Ti alloy to helium ion sputtering needs to be improved.
In order to improve the resistance of V-4Cr-4Ti alloy to helium ion sputtering and effectively reduce the bubbling and skin phenomenon caused by helium ion sputtering on the alloy surface, the oxygen embrittlement phenomenon can be reduced by reducing the content of solid dissolved oxygen in V-4Cr-4Ti alloy. The doping of rare earth elements in V-4Cr-4Ti alloy can effectively reduce the content of solid dissolved oxygen in the alloy and the grain size of the alloy. The reduction of solid dissolved oxygen content and grain size in the alloy is beneficial to the improvement of the toughness of the alloy, which is expected to improve the anti-helium ion sputtering ability of the alloy. Therefore, the vanadium alloy with better inhibition of helium ion sputtering can be prepared by adding proper rare earth elements in the melting process of V-4Cr-4Ti alloy.
