Tantalum powder of existing technology has complex shape, stone block structure, sheet structure and spongy structure, rough surface; Moreover, the poor sphericity and particle size distribution of tantalum powder lead to poor fluidity and formability of tantalum powder particles, which limits the use of these powders, especially their use in the manufacture of printed products. In particular, the existing process of tantalum powder also has the defect of low density, which affects the mechanical properties of the printed parts. Chinese patent CN87101648A provides a spherical or spherical surface of high pressure tantalum powder and manufacturing process. The invention USES plasma technology to make the impurities of tantalum powder evaporate simultaneously during spherification, thus improving the electrical properties of the product. The Chinese patent CN101439403A provides a preliminary treatment process for the preparation of the raw material for the induction plasma capacitor capacitor tantalum powder. The process includes the following steps: tantalum powder with the particle size of 2-10 houm is prepared by sodium reduction as the raw material; The invention is capable of continuous preparation of capacitor grade nanometer and sub-micron tantalum powder, through spherification, sieving and grading treatment, making the raw material spherical, and the powder particle size control is more than 90% in 2-5 crystalline m powder. These two existing technologies are aimed at capacitor grade tantalum powder, and the requirements on sphericity, purity and other aspects are very low.
Moreover, the technical personnel in this field know that the physical and chemical properties of nickel powder and valve metal powder such as tantalum powder, niobium powder and tantalum niobium alloy powder are very different. The field technicians also unknown, tantalum, niobium and tantalum niobium alloy, such as high melting point, such as tantalum as high as 2996 ℃, melting point of previous spheroidizing, purification methods of process temperature is difficult to achieve the melting point. Other patents also cover fine spherical powders prepared through high frequency plasma systems, but still do not meet the requirements of 3D printing and medical devices for high purity, large particle size, small porosity and high density tantalum, niobium, tantalum alloy metal powders. The invention provides a spherical tantalum, niobium or tantalum niobium alloy powder and a preparation method thereof. Specifically, the present invention provides a high-purity, spherical tantalum, niobium or tantalum niobium alloy powder with a particle size range of 25 prolonging m-180 prolonging m, and preferably 35-165 prolonging m, including: O under 1,500ppm, C under 1500ppm, N under 150ppm, and/or Fe under 10ppm. The powder can well meet the requirements of 3D printing and medical apparatus for high-purity and large-size tantalum, niobium, tantalum niobium alloy metal powder.
