Molybdenum-niobium alloy material has been widely used as an important target material for wiring in IXD(Liquid Crystal Display) production due to its excellent electrical conductivity, oxidation resistance and low coating stress. With the continuous development of LCD TV, tablet PC, mobile phone and other industries at home and abroad, the demand for high-performance molybdenum-niobium alloy is increasing day by day. The material requires high alloy purity, high target density, relative density greater than 96.0%, and uniform grain size during use. But in practice, because molybdenum-niobium alloy is a replacement solid solution alloy, sintering densification is difficult. After ordinary isostatic pressing, the density of the blank is low, which is about 60-65% of the relative density, but the density of the sintered plate is low, with the relative density less than 95%, due to the high porosity of the blank. Therefore, the molybdenum and niobium alloy produced by traditional isostatic pressing and sintering method cannot meet the production requirements of molybdenum and niobium alloy plates for sputtering target materials.
In order to solve the above technical problems, the technical solution adopted in the present invention is: a method for preparing molybdenum and niobium alloy plate for sputtering target material, which is characterized in that the method consists of the following steps:
Step 1: niobium powder and molybdenum powder with average granularity of 3 -8 is arranged in the blender according to the ratio of 1:9 and the mixing tank is processed by 4h under the condition of 40rpm ~ 60rpm.
Step 2. The mixture in Step 1 is vibrated to obtain the molybdenum-niobium alloy powder billet. The vibration frequency of the vibration suppression process is 2000Hz ~ 6000Hz, the suppression force is 1OMPa ~ 30MPa, and the pressure holding time is 30s ~ 60s.
Step 3. The molybdenum-niobium alloy powder billet in Step 2 was sintered in a vacuum sintering furnace. After the temperature in the furnace rose to 1900°C ~ 2100°C, the molybdenum-niobium alloy slab was prepared by holding heat for 6h ~ 10h.
Step 4: The molybdenum-niobium alloy slab in Step 3 is mechanically cut to obtain the molybdenum-niobium alloy plate for sputtering target material of the required size.
