A molybdenum niobium alloy production process of target material, whose character is: the high purity molybdenum powder and niobium powder mixing in the mixer, niobium powder and molybdenum powder according to the weight ratio of 9 put in mixer, in 1400 ~ 1900 ℃ high temperature vacuum burning furnace burning into molybdenum, niobium alloy sintered pieces with a hydraulic press and broken into pieces after in agate ball mill, grind under helium gas protection Grinding. The ratio of grinding ball is 1/3, and the powder with revolution of 600 is pressed and formed in the vacuum pressure sintering device at the pressure of 12 ~ 25 MPa and pressed at 1450 ~ 2020℃ for 30 ~ 90 minutes to get the target blank. The finished target material is finished by finishing on the grinder. The method of the invention has simple technological process and is easy to realize industrial production. No pollution, the preparation process will not produce any waste, waste acid and other pollutants.
The niobium bar with relative purity of >99.95% was used to obtain Φ160mm niobium ingot after two electron beam smelting. The niobium ingot was made into target sample by forging → machining → rolling → heat treatment → leveling → machining → testing → finished product. The finished samples were heat treated at 850,920,1000,1050℃, respectively. The microstructure and grain size of the samples after different heat treatment were tested. The results show that at 1100℃, the grain can be broken and the plastic deformation activation energy can be improved, and (111) texture can be easily formed. In the rolling process, the grain size of the sheet can be uniform and the vertical and horizontal difference can be reduced when the first processing rate ε1≥30% and the deformation ratio Δ before and after the reverse rolling is 1.6. After heat treatment at 920℃ for 1 h, the grain size of the finished product is less than 100 μm, the grain orientation is consistent and the grain size distribution is uniform, which is beneficial to improve the quality of the sputtering film.
The development of display technology has brought investment opportunities in display materials. It is estimated that the overall scale of the global display panel will exceed $130 billion in 2022, with LCD panels accounting for about 70%. The permeability of small and medium-sized OLED is increasing rapidly, while large LCD occupies the mainstream. LCD and OLED will use polarizer, glass substrate, target material, photomask plate, photoresist and other products in the production process. Polaroid market size of more than 110 billion, glass will reach more than 31 billion global market, target market is expected to reach more than 55 billion, photomask version of global market size of about 8.6 billion, resist market scale will reach 20.2 billion, color filter market size of about 23.5 billion. In addition, the LCD and backlight modules are unique to LCD; Organic light-emitting materials for OLED. On the whole, it shows that the material market is large enough. On this basis, we have sorted out three investment logics: boom upswing, industrial transfer and domestic substitution.
