A preparation method of cobalt tantalum alloy powder, cobalt tantalum alloy powder and its use, the preparation method of cobalt tantalum alloy powder includes: first prepare cobalt material and tantalum material in accordance with the ratio of target atoms and mix; Then at 1380 1600℃ melting complete; Subsequently, the cobalt tantalum alloy powder is obtained by atomization under the action of inert gas. The preparation method to control the melting temperature of the cobalt tantalum mixture is 1380 1600℃, and optimize the atomization conditions, so that the purity of the cobalt tantalum alloy powder prepared is ≥ 99.95%, the oxygen content is less than 600ppm, using the screening of the particle size of the cobalt tantalum alloy powder is less than 150 purposes, It is beneficial to prepare Fe-CoT-Ta alloy sputtering target material with high purity, high density, high bending strength and qualified magnetic flux. Among them, the tantalum edge material of tantalum target material is prepared as tantalum material to realize the transformation of waste into treasure.
At present, vertical magnetic recording technology has completely replaced horizontal magnetic recording technology in the magnetic recording market. Because, the vertical magnetic recording technology makes the surface density and capacity of magnetic recording media show a rapid growth, the common magnetic recording media are hard disk, disk and disc, etc. Magnetic recording medium generally adopts multi-layer vertical structure design, taking hard disk as an example, specifically including lubrication layer, protective layer, magnetic recording layer, middle layer, soft magnetic substrate layer, substrate layer and substrate layer. Among them, the soft magnetic substrate mainly plays the function of recording and storing data, and plays a very important role in the magnetic recording medium. At present, ferrocobalt-tantalum alloy films obtained by sputtering process are the most commonly used soft magnetic substrates.
The ferrocobalt-tantalum alloy sputtering target used for the preparation of soft magnetic substrate requires high density, high flexural strength and high magnetic flux. High density can ensure that the film obtained by sputtering is relatively uniform, and is not easy to occur "discharge" and other abnormal phenomena. The bending strength will affect the coercivity of magnetic materials, which has a crucial impact on the storage of its information. Therefore, high bending strength can ensure that the target is not prone to cracking and other abnormal problems when used. The magnetic flux of target material is a very important parameter in magnetic recording target material. Generally, the higher the magnetic flux of target material, the stronger the ability of recording and storing data. Therefore, the quality of ferrocobalt-tantalum alloy sputtering target material is related to the soft magnetic substrate, and even the development of the whole magnetic recording industry.
